A thin film transistor array substrate, a photolithography process and a design
of a mask thereof are provided. A photoresist layer is formed on a substrate, and
a mask is set above the substrate. Then, the display element area of the mask is
blocked in order to perform the exposure process to the photoresist layer. After
that, the non-display element area of the mask is blocked in order to perform the
exposure process to the photoresist layer. Finally, a development process is performed
to pattern the photoresist layer. Wherein a plurality of pixel patterns is formed
in the photoresist layer corresponding to the display element area, and a plurality
of peripheral circuit patterns and a plurality of stitching pixel pattern are formed
in the photoresist layer corresponding to the non-display element area. Moreover,
each one of the stitching pixel patterns is connected to the corresponding pixel patterns.
