In some aspects, a method of forming a carbon nano-tube (CNT) memory cell is provided that includes (1) forming a first conductor; (2) forming a steering element above the first conductor; (3) forming a first conducting layer above the first conductor; (4) forming a CNT material above the first conducting layer; (5) implanting a selected implant species into the CNT material; (6) forming a second conducting layer above the CNT material; (7) etching the first conducting layer, CNT material and second conducting layer to form a metal-insulator-metal (MIM) stack; and (8) forming a second conductor above the CNT material and the steering element. Numerous other aspects are provided.