Wordline stacks are arranged parallel at a distance from one another on a substrate surface. Bitlines are arranged transversely to the wordline stacks at a distance from one another. Source/drain regions are formed as doped regions in the vicinity of the wordline stacks. A resistive layer is disposed between a plurality of the source/drain regions and the bitlines and formed of a material having a resistance that is switched by an applied voltage. Source lines are arranged parallel to the wordline stacks so that they connect further pluralities of the source/drain regions.

 
Web www.patentalert.com

< Thin film transistor substrate and manufacturing method thereof

> Semiconductor device with a field stop zone

> Semiconductor components having through interconnects

~ 00521