A system and method for determining whether a desired integrated circuit layout can be accurately modeled from a resist model that is calibrated from a mask test pattern. In one embodiment, a chessboard graph is created having horizontal and vertical axes that are assigned two imaging parameters calculated from the test mask data and the desired integrated circuit layout data. Data on the horizontal and vertical axes of the chessboard graph are divided into a number of ranges or bins. The intersection of each bin on the horizontal and vertical axis is associated with a subgraph that plots the relation between two additional imaging parameters having values of the first two imaging parameters in the ranges of the intersecting bin.