A nonvolatile semiconductor memory according to an example of the present invention is provided with a memory cell having a floating gate electrode and a control gate electrode, and a select gate transistor having a select gate electrode and connected in series to the memory cell. A cell unit is comprised with the memory cell and the select gate transistor. A bird's beak of the edge at the memory cell side of the select gate electrode is larger than a bird's beak of at least one edge of the floating gate electrode.

 
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> Pattern forming method and semiconductor device manufactured by using said pattern forming method

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