An electro-optical device includes, above a substrate: data lines extending in a first direction; scanning lines extending in a second direction and intersecting the data lines; pixel electrodes and thin film transistors disposed so as to correspond to intersection regions of the data lines and the scanning lines; storage capacitors electrically connected to the thin film transistors and the pixel electrodes; and shielding layers disposed between the data lines and the pixel electrodes. Further, nitride films are included in the shielding layers and are formed along the data lines and are wider than the data lines.


< Wiring pattern formation method, manufacturing method for multi layer wiring substrate, and electronic device

> Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method

~ 00405