A semiconductor package comprising a semiconductor wafer having an active surface
comprising at least one integrated circuit, wherein each integrated circuit has
a plurality of bond pads; and at least one cured silicone member covering at least
a portion of the active surface, wherein at least a portion of each bond pad is
not covered by the silicone member, the silicone member has a coefficient of linear
thermal expansion of from 60 to 280 m/m C. between -40 and 150
C. and a modulus of from 1 to 300 MPa at 25 C., and the silicone member is
prepared by the method of the invention.