Structure and method for formation of a blocked silicide resistor

   
   

A process of forming a nitride film on a semiconductor substrate including exposing a surface of the substrate to a rapid thermal process to form the nitride film.

Ein Prozeß der Formung eines Nitridfilmes auf einem Halbleitersubstrat einschließlich das Aussetzen einer Oberfläche des Substrates einem schnellen thermischen Prozeß, um den Nitridfilm zu bilden.

 
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