A method and apparatus for calibrating a metrology tool are disclosed. The apparatus includes a substrate having at least one calibration site formed thereon. The calibration site includes a pattern of cells that have at least one feature disposed in a surface of the substrate. The feature provided for measurement by a step height metrology tool and a phase metrology tool to calibrate the step height and phase metrology tools.

 
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> Epitaxial semiconductor structures having reduced stacking fault nucleation sites

> Wire-type semiconductor devices and methods of fabricating the same

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