A semiconductor light-emitting device includes: a substrate; a first conductivity type layer formed on the substrate and including a plurality of group III-V nitride semiconductor layers of a first conductivity type; an active layer formed on the first conductivity type layer; and a second conductivity type layer formed on the active layer and including a group III-V nitride semiconductor layer of a second conductivity type. The first conductivity type layer includes an intermediate layer made of Al.sub.xGa.sub.1-x-yIn.sub.yN (wherein 0.001.ltoreq.x<0.1, 0

 
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> Epitaxial semiconductor structures having reduced stacking fault nucleation sites

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