A developing apparatus which enables the time necessary for a development reaction
to be shortened and permits uniform development includes a chuck device with a
support portion whose top surface is a horizontal surface and a spinner disposed
in the middle of this support portion. The support portion and the spinner are
provided within an antiscattering cup. A groove which vacuum adsorbs a substrate
W to be treated is formed on the top surface of the spinner, a pipe which forms
a circulation path is disposed within the groove formed on the top surface of the
support portion, and a cleaning nozzle which cleans a developing solution which
has flown behind the rear surface of the substrate W is disposed in a position
which is nearest to the inside diameter of the top surface of the support portion.
On the other hand, in a nozzle device, a spray nozzle is attached to a horizontally
reciprocating arm via a columnar support. A developing solution pipe and an air
supply pipe are inserted into this spray nozzle and a temperature-regulated developing
solution from the developing solution supply pipe is spouted in mist form from
the bottom end of the spray nozzle.
