Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes "merit function" for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

 
Web www.patentalert.com

< Flexible medical sensor enclosure

> Method and medium for selecting a merchant for a trial mode of a delivery service

> Enhanced capture, management and distribution of live presentations

~ 00599