The invention is directed to preparing optical elements having a thin, smooth, dense coating or film thereon, and a method for making such coating or film. The coated element has a surface roughness of <1.0 nm rms. The coating materials include hafnium oxide or a mixture of hafnium oxide and another oxide material, for example silicon dioxide. The method includes the use of a reverse mask to deposit the coating or film on a rotating substrate.

 
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> Group I-VII semiconductor single crystal thin film and process for producing same

> Micro-electromechanical microshutter array

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