Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.

 
Web www.patentalert.com

< Materials for use in electrophoretic displays

> Transparent oxide electrode film and manufacturing method thereof, transparent electroconductive base material, solar cell and photo detection element

> Composition for forming a conjugated polymer pattern and process of forming a conjugated polymer pattern using the same

~ 00580