A method of forming a crystalline silicon layer on a microrough face of a substrate by reducing the microroughness of the face and then performing a metal induced crystallization process on the face is disclosed.

 
Web www.patentalert.com

< Method for fabricating reverse-staggered thin film transistor

> Vertical memory device and method

> Nanowire photodiodes and methods of making nanowire photodiodes
~ 00580