A substrate processing apparatus arranged adjacent to an exposure device
includes a processing section that subjects a substrate to processing and
an interface provided adjacent to one end of the processing section
configured to transfer and receive the substrate between the processing
section and the exposure device. The processing section includes a
photosensitive film formation unit configured to form a photosensitive
film composed of a photosensitive material on the substrate that has not
been subjected to exposure processing by the exposure device, a top
surface and edge cleaning unit configured to clean a top surface and an
edge of the substrate, and a development unit configured to subject the
substrate to development processing after the exposure processing by the
exposure device.