A process for producing a resist composition that yields a resist composition in which the occurrence of defects has been suppressed, a filtering apparatus that can be used favorably within the production process, a resist composition applicator that is fitted with the filtering apparatus, and a resist composition in which the level of defects has been suppressed. This composition is obtained by passing a resist composition, which is obtained by dissolving a resin component that displays changed alkali solubility under the action of acid and an acid generator component that generates acid upon exposure in an organic solvent, through a filter equipped with a polyethylene hollow thread membrane.