A method and system for manufacturing a spacer layer in a magnetoresistive element are described. The spacer layer resides between a free layer and a pinned layer. The method and system include providing a first metallic layer and oxidizing the first metallic layer in a first environment including at least oxygen and a first gas inert with respect to the first metallic layer. The method and system further include providing a second metallic layer and oxidizing the second metallic layer in a second environment including at least oxygen and a first gas inert with respect to the first metallic layer.

 
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< Head gimbal assembly including a flexure with a first conductive trace disposed between a slider and a dielectric layer

> Faster programming of highest multi-level state for non-volatile memory

> Method for using a hierarchical bit line bias bus for block selectable memory array

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