Stain resistant composition comprises a hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A method to provide stain resistance to a substrate comprises applying the stain resistant composition to said substrate. Suitable substrates include textiles and hard surfaces.

 
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> Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shifters

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