One embodiment of the present invention provides a system that modifies a layout to improve manufacturing robustness. During operation, the system receives a layout. The system then selects a segment in the layout. Next, the system determines a target location in the proximity of the segment where the value of a process-sensitivity model is within a desired range of values. The system then modifies the layout so that the segment is located at the target location. The layout modification can cause the pattern which is associated with the segment to exhibit isofocal behavior, which can improve manufacturing robustness.