Embodiments of a method and apparatus for determining a substrate exchange
position in a processing system are provided. In one embodiment, a method
of determining a substrate exchange position in a processing system
includes determining an initial exchange position within a processing
chamber, and resolving a change in the exchange position. The step of
resolving may further include the step of sensing a change in temperature
of a facet of a transfer chamber having the processing chamber coupled
thereto, sensing a change in a state of the system, or sensing a change
in position of the processing chamber, among others.