An exposure apparatus for exposing a substrate to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to update the parameter. Prior to execution of a unit of the processing, the control system determines that the update system is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.