In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.

 
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< Piezoelectric element, piezoelectric actuator, and ink jet recording head

> Compositions comprising at least one carbodiimide

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