A method for preparing a microelectromechanical system (MEMS) device for
subsequent processing is disclosed. The method includes establishing an
anti-stiction material on exposed surfaces of the MEMS device. The
exposed surfaces include at least an interior surface of a chamber and an
external surface of the MEMS device. The anti-stiction material is
selectively removed from at least a portion of the external surface via a
plasma sputtering process under controlled conditions.