Method, apparatus, and article of manufacture for a diode defined by a portion of a gate layer of an integrated circuit. Illustrative, non-limiting embodiments of the invention are provided, including a temperature compensated DRAM, a temperature compensated CPU, a temperature compensated logic circuit and other on-chip temperature sensor applications.

 
Web www.patentalert.com

< Transistors, semiconductor integrated circuit interconnections and methods of forming the same

> Method of forming dual gate dielectric layer

~ 00469