A marking system includes at least one image applying component for applying a marking material to a substrate in forming an image on the substrate. The marking material includes a radiation sensitive material. An addressable irradiation device receives the marked substrate from the image applying component. The irradiation device provides an array of addressable irradiation elements which irradiate the marked substrate. At least some of the irradiation elements are selectively actuable. The irradiation device emits radiation within a range of wavelengths to which the radiation sensitive material is sensitive.

 
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> Direct patterning of silicon by photoelectrochemical etching

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