A method of edge bevel rinse. First, a wafer having a coating material layer disposed thereon is provided. A light beam is optically projected on the wafer to form a reference pattern. The reference pattern defines a central region, and a bevel region surrounding the central region on the surface of the wafer. Subsequently, the coating material layer positioned in the bevel region is removed according to the reference pattern.

 
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> Method of enantioselective nucleophilic addition reaction of enamide to carbonyl group and synthesis method of optically active .alpha.-hydroxy-.gamma.-keto acid ester and hydroxydiketone

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