A method for designing an illumination light source, includes acquiring a control feature to control a dimension of a transferred pattern of a mask pattern; designating a plurality of illumination elements illuminating the mask pattern; designating first illumination lights to each of first polarization states of a light emitted from each of the illumination elements; calculating a first optical image of the control feature, formed on a first imaging plane by each of the first illumination lights; and determining an illumination shape and a polarization state distribution of the light, based on an optical characteristic of the first optical image.

 
Web www.patentalert.com

< Integrated circuit device and electronic instrument

> Waveform determining device, waveform determining method, droplet ejecting device, droplet ejecting method, film forming method, device manufacturing method, electronic optical device, and electronic device

~ 00441