A lithographic projection apparatus includes a liquid confinement
structure extending along at least a part of a boundary of a space
between a projection system and a substrate table. The liquid confinement
structure is positioned adjacent a final surface of the projection system
and includes a first inlet configured to supply a liquid, through which a
patterned beam is to be projected, to the space, and a second inlet
configured to supply gas and formed in a face of the structure. The face
is arranged to oppose a surface of the substrate and the second inlet is
located radially outward, with respect to an optical axis of the
projection system, of the space and has a porous member to evenly
distribute gas flow over an area of the second inlet.