An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage which drives the substrate, a focus measurement unit which obliquely irradiates the substrate with measurement light to measure the position of the substrate in the direction of the axis of the exposure beam on the basis of the light reflected by the substrate, and a controller which executes a calibration for correcting, on the basis of the measurement result obtained by the focus measurement unit, a track plane of the substrate stage with reference to the reference plane of the focus measurement unit so as to set the track plane parallel to the reference plane.