A method of forming a pattern of elements is shown. In one embodiment, the
method is used to create a reticle. In another embodiment, the method is
used to further form a number of elements on a surface of a semiconductor
wafer. Identified problem structures or regions in a pattern of elements
are moved from lower level cells of a hierarchy structure into higher
level cells before edge movement takes place. Because all cells have been
selectively leveled first, substantially all external influences to cells
have been removed for each cell before edge movement takes place. The
methods and procedures described herein therefore reduce the possibility
of undesirable modifications such as electrical shorts. The methods and
procedures described herein also reduce overall processing time.