A method for determining a property of an insulating film is provided. The
method may include obtaining a charge density measurement of the film, a
surface voltage potential of the film relative to a bulk voltage
potential of the substrate, and a rate of voltage decay of the film. The
method may also include determining the property of the film using the
charge density, the surface voltage potential, and the rate of voltage
decay. A method for determining a thickness of an insulating film is
provided. The method may include depositing a charge on the film,
measuring a surface voltage potential of the film relative to a bulk
voltage potential of the substrate, and measuring a rate of voltage decay
of the film. The method may also include determining a thickness of the
film using the rate of voltage decay and a theoretical model relating to
current leakage and film thickness.