A coating and developing apparatus includes a process block which includes
a unit block for coating-film formation which applies a resist, and a
unit block for development which performs a developing process, and is
separately provided with a coating-film-formation-unit-block transfer
mechanism and a developing-process-unit-block transfer mechanism. After a
substrate after exposure is transferred to a transfer stage from the
interface-block transfer mechanism, the timing for the
developing-process-unit-block transfer mechanism to receive the substrate
is adjusted in such a way that the time from exposure of the substrate to
transfer of the substrate to a heating unit becomes a preset time.