A monitoring system is presented. The monitoring system may include a
first chemical vessel containing a first chemical mixture and a second
chemical vessel containing a second chemical mixture. The monitoring
system may further include a sensor configured to selectively receive a
first sample flow of the first chemical mixture from the first chemical
vessel and a second sample flow of the second chemical mixture from the
second chemical vessel. The sensor may be configured to measure a first
sample attribute value of the first sample flow and a second sample
attribute value of the second sample flow. By multiplexing multiple
sample flows through a sensor, the monitoring system may monitor
attributes of multiple chemical mixtures without requiring separate
sensors for each chemical mixture monitored by the system.In an
embodiment, the monitoring system is preferably configured to control an
attribute of a chemical mixture. In such a case, the monitoring system
may further include a control system configured to receive the first
sample attribute value and the second sample attribute value from the
sensor. The control system is further preferably configured to input the
first sample attribute value into a first attribute control algorithm to
calculate a first attribute control output. The first chemical mixture
includes a first bulk attribute value, and the control system is
preferably configured to direct the adjusting of the first bulk attribute
value.