Polarized reticles, photolithography systems utilizing a polarized
reticle, and methods of using such a system are disclosed. A polarized
reticle is formed having a reticle containing at least one first
patterned region at least partially surrounded by at least one second
patterned region. The first patterned region of the polarized reticle
includes a polarized material and the second patterned region of the
polarized reticle also includes a polarized material. Polarization
directions of the polarized materials of the two regions are generally
orthogonal to each other. When the polarized reticle is irradiated using
linear polarized light having a selected polarization direction, the
polarized materials on the two regions of the polarized reticle may be
selectively used as a filter to enable exposing the different regions of
the polarized reticle separately under optimal illumination conditions.