A preferred embodiment of the invention is directed to support structures such as spacers used to provide a uniform distance between two layers of a device. In accordance with a preferred embodiment, the spacers may be formed utilizing flow-fill deposition of a wet film in the form of a precursor such as silicon dioxide. Formation of spacers in this manner provides a homogenous amorphous support structure that may be used to provide necessary spacing between layers of a device such as a flat panel display.

 
Web www.patentalert.com

< Semiconductor substrate and method of fabricating semiconductor device

< Structural reinforcement of highly porous low k dielectric films by Cu diffusion barrier structures

> Colloidal solution comprising silver metal particles and a silane derivative

> Magnetically shielded conductor

~ 00292