A method for rapid prototyping by using plane light as sources treats the raw material by two stages. The first stage includes a step of spreading raw material onto a defined zone by nozzles and rolling the material to have a flat surface and a step of illuminating the raw materials by plane light and electronic beams to cause a first time of physical or chemical changes. The second stage includes a step of using more powerful plane light source with cooperation with portable Digital Micromirror Device (DMD) or Liquid Crystal Display (LCD) to scan the selected zones of the material to cause a second time of physical or chemical changes, and a step of stacking the 2-D images so as to obtain a solid work piece.

 
Web www.patentalert.com

< Method and apparatus for rapid prototyping of monolithic microwave integrated circuits

< Method and apparatus for rapid prototyping of monolithic microwave integrated circuits

> Method and apparatus for rapid prototyping of monolithic microwave integrated circuits

> Method and apparatus for rapid prototyping of monolithic microwave integrated circuits

~ 00277