The invention includes an apparatus and a method of manufacturing such
apparatus including the steps of: forming a layer to be patterned,
forming a photosensitive layer over the layer to be patterned, patterning
the photosensitive layer to form a pattern including a horizontal line
and a vertical line without a space therebetween, transferring the
pattern to the layer to be patterned, forming a second photosensitive
layer over the pattern, patterning the second photosensitive layer to
form a second pattern including a space aligned between the horizontal
line and the vertical line, and transferring the second pattern to the
layer to be patterned to form a third pattern including a horizontal line
and a vertical line with a space therebetween, the space including a
width dimension achievable at a resolution limit of lithography.