An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer) of photocurable material prior to depositing an additional layer or layers of photocurable material that may be imaged and developed to produce a desired relief image on the surface of the photosensitive printing element. The photosensitive printing element is then thermally developed by contacting the photosensitive printing element with at least one roll that is capable of moving over at least a portion of the imaged surface of the flexographic printing element to remove the softened or melted non-crosslinked photopolymer. Non-crosslinked photopolymer on the imaged and exposed surface of the flexographic printing element can be softened or melted by positioning a heater adjacent to the imaged surface of the flexographic printing element and/or heating the at least one roll that contactable with the imaged surface of the flexographic printing element.

 
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< Low activation energy positive resist

< Positive resist containing naphthol functionality

> Fluorinated photoresist materials with improved etch resistant properties

> Photosensitive coating material for a substrate

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