The present invention provides a method for the patterned metallization of a surface of a substrate, comprising the steps of preheating the substrate to a temperature which is below a deposition temperature of a predetermined metal dissolved in a fluid provided above the surface, and performing patterned deposition of the predetermined metal in predetermined regions on the surface of the substrate by locally increasing the temperature to above the deposition temperature.

 
Web www.patentalert.com

< Method for creating barrier layers for copper diffusion

< Method for fabricating semiconductor components by forming conductive members using solder

> Method of reworking layers over substrate

> Method for manufacturing electronic circuits integrated on a semiconductor substrate

~ 00239