A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

 
Web www.patentalert.com

< Apparatus for applying DC power to an inductive load

< Power distribution network for optoelectronic circuits

> Generating vehicle traffic data from raw location data for mobile units

> Method and apparatus for macroblock DC and AC coefficient prediction for video coding

~ 00232