A ferroelectric capacitor in a semiconductor device is constructed of a Pt lower
electrode, a ferroelectric thin film and a Pt upper electrode that are successively
laminated onto a silicon substrate. The ferroelectric thin film is constructed
of a plurality of SBT layers. Crystal grains of the SBT layer are formed smaller
than the crystal grains of the SBT layers. The SBT layer having small size grains
improves the electrical characteristics and the ferroelectric characteristics of
the ferroelectric capacitor.