Techniques for fabricating a device include forming a fabrication layout,
such as a mask layout, for a physical design layer, such as a design for an integrated
circuit, and identifying evaluation points on an edge of a polygon corresponding
to the design layer for correcting proximity effects. Techniques include correcting
for proximity effects associated with an edge in a first fabrication layout by
determining whether any portion of the edge corresponds to a target edge in a design
layer. The first fabrication layout corresponds to the design layer that indicates
target edges for a printed features layer. If any portion of the edge corresponds
to the target edge, then it is determined whether to establish an evaluation point
on the edge. Then it is determined how to correct the edge for proximity effects
based on the evaluation point. In case it is determined that no portion of the
edge corresponds to the target edge, then no evaluation point is selected on the edge.
