Pump lubrication system including an external reservoir

   
   

A circulating lubrication system for a centrifugal pump, or other rotating equipment utilizing an oil sump, is disclosed. The lubrication system includes an external reservoir located distant from the main lubrication chamber, so that lubricating fluid from the main misting chamber is forced out of the main chamber, cooled and cleaned (i.e. filtered) in the external reservoir, and thereafter fed back into the main lubricating chamber. In such a manner, the lubrication system maintains substantially clean, cool, and moisture free lubricating fluid in the main misting chamber and reduces the required downtime of the device. Thus, the life span of the device is lengthened while at the same time production is increased.

 
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