A particle-beam exposure apparatus (1) for irradiating a target (41)
by means of a beam (2) of energetic electrically charged particles comprises:
an illumination system (101) for generating and forming said particles into
a directed beam (21); a pattern definition means (102) located after
the illumination system for positioning a pattern of apertures transparent to the
particles in the path of the directed beam, thus forming a patterned beam (22)
emerging from the pattern definition means through the apertures; and a projection
system (103) positioned after the pattern definition means (102)
for projecting the patterned beam (22) onto a target (41) positioned after
the projection system. The apparatus further comprises an acceleration/deceleration
means (32) containing an electric potential gradient which is oriented substantially
parallel to the path of the structured beam and constant over at least a cross-section
of the beam.
