Position measuring method and apparatus

   
   

A position measuring apparatus which measures positions of first and second marks. The apparatus includes a detection system which detects an image of the first and second marks, an image processing system which processes the image of the first and second marks, and control system which controls the detection system and the image processing system so that at least two images, of which signal intensities are adjusted with respect to the first and second marks, respectively, are obtained.

 
Web www.patentalert.com

< Programmable power supply system

< Delay locked loop for improving high frequency characteristics and yield

> Method of measuring aberration in an optical imaging system

> Semiconductor memory device and defect remedying method thereof

~ 00183