An apparatus and method is provided for analyzing or conditioning an electrochemical
bath. One aspect of the invention provides a method for analyzing an electrochemical
bath in an electrochemical deposition process including providing a first electrochemical
bath having a first bath composition, utilizing the first electrochemical bath
in an electrochemical deposition process to form a second electrochemical bath
having a second bath composition and analyzing the first and second compositions
to identify one or more constituents generated in the electrochemical deposition
process. Additive material having a composition that is substantially the same
as all or at least some of the one or more constituents generated in the electrochemical
deposition process may be added to another electrochemical bath to produce a desired
chemical composition. The constituents may be added at the beginning of the use
of the bath to initially condition the electrochemical bath or may be added, preferably
either continuously or periodically, during the electrochemical deposition process.
