A method and system are provided for monitoring erosion of system components
in
a plasma processing system. The system components contain emitters that are capable
of producing characteristic fluorescent light emission when exposed to a plasma.
The method utilizes optical emission to monitor fluorescent light emission from
the emitters for determining system component status. The method can evaluate erosion
of system components in a plasma, by monitoring fluorescent light emission from
the emitters. Consumable system components that can be monitored using the method
include rings, shields, electrodes, baffles, and liners.
