Semiconductor laser device and fabrication method thereof

   
   

A semiconductor laser device includes a substrate and an n-GaN layer composed of a nitride semiconductor formed on the substrate. The substrate includes a trench having as a slope a plane inclined 62 degrees from the main plane of the substrate, or a plane inclined within 3 degrees in an arbitrary direction from the inclined plane. The n-GaN layer is formed on the slope. On the n-GaN layer are formed a lower clad layer, an active layer, and an upper clad layer, each composed of a nitride semiconductor. The active layer has a plane orientation substantially matching the plane orientation of the main plane.

 
Web www.patentalert.com

< Method for frequency and mode stabilisation of a tuneable laser that has at least three sections

< Long pulse vanadate laser

> Image forming device with duct for exhausting heat outside main body case

> Diode laser device with cooling and operation monitoring

~ 00177