Fluorinated polymers, photoresists and associated processes for microlithography
are described. These polymers and photoresists are comprised of esters derived
from fluoroalcohol functional groups that simultaneously impart high ultraviolet
(UV) transparency and developability in basic media to these materials. The materials
of this invention have high UV transparency, particularly at short wavelengths,
e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.
